Ramadas Nambatyathu

Iam having very good experience in Dry etching characterization and  process development.  I have more than 32  years experience in dry etching.  Worked  almost all technology  (>90nm). Acquired good knowledge in etching  all types of film ( Al,Si,SiO2,GaN, Si3N4,TiN, TaN,Al2O3).  Also  worked in different technology like  CMOS, Power MOS, Trench MOS, Silicon photonics  device, GaN, SiC, BiCMOS etc. Currently working in Glolbalfoundries Singapore.

Good experience in dry etch process characterization of almost all films. 

Developed  processes for 0.6um /0.35 process for EEPROM, BiCMOS, Logic for ll layers

Developed  dry etch processes for  0.25, 0.13, 0.09um process for all layers

Good experience in both Al and Cu process ( Logic as well as RF products)

All projects completed in schedule time

BTech  in Electrical engineering    Govt. Engineering  Trichur, Kerala , India  (1987)

MTech  in Microelectronics     IIT Madras, India   (19189)