- Scatterometry is a technique that uses light to measure critical dimension of a post-etch structure during wafer fabrication.
- Machine Learning (ML)-based scatterometry uses supervised learning model to evaluate the measurement value from the light information.
- With the advancement in technology, improving metrology tool matching is always challenging in production with the tighten of process control limit. ML-based scatterometry is used to overcome the challenge.
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Intern - Product Integration Engineer (PIE) Metrology (Polytechnic Students) - Singapur, Singapore - Micron
Description
Our vision is to transform how the world uses information to enrich life for all.
Join an inclusive team passionate about one thing: using their expertise in the relentless pursuit of innovation for customers and partners. The solutions we build help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can fuel the very innovation we are pursuing.
JR39491 Intern - Product Integration Engineer (PIE) Metrology (Polytechnic Students)Project Title: Deployment of improved Metrology tool matching methodology using machine learning based scatterometry to production environment.
Description:
Scope:
Opportunity to learn about scatterometry measurement technique.
Learn and understand the application of supervised learning technique.
Understand how to analyse the collected data and spectra before further optimizing the ML models. And then these models will be deployed to the production environment.
Deliverable:
To deploy the improved tool matching methodology to production environment for cost saving and enhances inline measurement performance and quality
Skillset Require: Students pursuing Diploma's degree in engineering
Course of interests: Engineering
Duration Period: 4 months